Thursday, September 29, 2011

Our first thin film obtained with the ALD reactor

Today marks the first successful thin film growth of Titanium Dioxide on Silicon substrate with the new ALD reactor built last summer in Dr. Costel Constantin's lab. This will enable us to grow oxide nanolayers or nanowires on semiconducting surfaces that can be used in building more efficient field effect transistors. A crucial role in this success were the efforts of Matthew Chamberlin, Kristen Deganais (REU student from University of Maryland Baltimore County), Bojan Ljubovic, and Renee Ahern who joined our group at the beginning of this semester. Renee helped a lot with setting up the ALD reactor for several growth attempts preceding today's growth.