On September 21-23 2015, Dr. Scarel participated to the Symposium on Atomic Layer Deposition: Russia 2015. The event took place in Moscow and was hosted by the Moscow Institute of Physics and Technology. Dr. Scarel was invited to present her research on “Atomic layer deposition for rare earth oxides and thermoelectric thin films”. She described her research before joining JMU and her research at JMU with our undergraduate students. The symposium is historic in the Atomic Layer Deposition field because for the first time the Russian, European, and North American ALD teams confronted each other face-to-face. Below is a picture of the participants. Dr. Scarel is on the top row, toward the left ..... in the middle of the crowd.